This report describes the design, fabrication, and data analysis for a Mach-Zehdner Interferometer (MZI) implemented in a silicon on oxide wafer. The device was fabricated using electron beam lithography, and we explored variations in the path length difference of the two arms of the interferometer as well as varying the waveguide geometry. The designs were measured using an swept wavelength source, whereby the transmittance was shown to sinusoidally vary with respect to the input wavelength as expected through theory. We account as well as possible for the losses in coupling light onto and from the chip using grating couplers, and also for propegation losses through the strip waveguides. Finally, the match between the measurements and theory / simulation is evaluated, and we attempt to account for deviations in this match.