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The development of industrial processes involving``low-temperature''  plasmas is in a phase of rapid expansion. Recently added to continuing development in areas where plasmas have been long used, such as integrated circuit fabrication, are many applications in new domains such as plasma medicine and plasma agriculture, which show tremendous potential for a broad range of societal benefits. The attraction of plasmas for these applications derives from the role of the free electrons present in all plasmas. A unique quality of plasmas critical to many applications is the capability of non-equilibrium chemistry; ``high-temperature'' gas phase reactions occur while substrates remain cool. These gas phase reactions, producing `radicals,' highly reactive neutral and ionic species that react with exposed substrate surfaces, are enabled by an electron population selectively maintained at temperatures greater than 10,000 $^\circ$F through heating by electromagnetic fields. Collisions between molecules in the gas phase and highly energetic electrons cause negligible gas heating but, importantly, lead to significant rates for chemical reactions not possible at or near room temperature without a plasma. The electron temperature, $T_e$, is therefore a key process parameter, since rates for these reactions are strong functions of $T_e$.  The plan described herein to develop advanced diagnostic tools for low-temperature plasmas will make a contribution toward the ultimate goal of ``predictive design'' of plasma processes. In particular, we seek to go beyond standard OES (optical emission spectroscopy) by making use of previously untapped potential of the glow emitted by the plasma, in order to develop a non-invasive and easily-implemented diagnostic to quantify plasma properties central to many applications, including electron temperature, electron density and dissociation fraction. Development of the diagnostic for key process gases will require: 1) identification of emission lines and bands applicable to the method, 2) development of an optical emission model using published reaction rates quantifying the relation between emission intensities and plasma parameters, and 3) application to illustrative examples.  Plasma properties measured in this way will facilitate benchmarking of process simulations and will guide process development and optimization. Furthermore, fast data acquisition and analysis enabled by this approach raises the possibility of use in a feedback loop for real-time process control. {\bf MENTION community demand - plasma 2020, low temperature plasma report, etc.}  While our proposed research builds on experience gained in developing OES-based diagnostics of rare gas plasmas, if successful, it will contribute game-changing diagnostic tools in a new domain, molecular gas plasmas, with applicability to a wide array of plasma process applications. (And although plasma diagnostics using rare-gas spectroscopy in plasmas formed in mixtures of both molecular and rare gases, the addition of rare gases is not always a feasible and/or desirable approach.) However, going from a plasma in an atomic gas to even a {\it diatomic} molecular gas introduces new scientific challenges and potential rewards. Focusing on the plasma itself, the number of species present increases when even the simplest of molecular cases is considered.  Low pressure plasmas generated in pure oxygen have technological significance in a number of materials processing applications. Such processes rely on the interaction of neutral radicals, O$^+$ and O$_2^+$ with substrate surfaces exposed to the plasma. In many applications, achievement of process goals is sensitive to the relative fluxes of the different gas phase species to the substrate surface. Production of ion and neutral radical species occurs primarily through gas phase reactions involving collisions with energetic electrons, so that production {\it rates} are sensitive functions of electron density and electron temperature.