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\section{Transistors}  GaAs NW have high charge carrier mobility, a desirable trait for devices such as microchips, which has historically been dominated by Si technology. Miao and coworkers have recently done record breaking work by creating GaAs NW arrays in planar (as opposed to typical vertical) form for T-gated high electron mobility transistors (HEMTs).\cite{Miao_2014} A 1.5x1.5 $cm^2$ chip with 115 planar HEMTS was fabricated and characterized in terms of its DC current-voltage characteristics and radio frequency (RF) performance. Grwoth Growth  methods included etching alignment markers on a GaAs substrate with iductively coupled plasma, depositing Au seeds (100nm diameter and 300nm seperation distance) and VLS growth. growth.\cite{Miao_2013}  Characterization testing found $\frac{f_t}{f_{max}}=\frac{33}{75}GHz$ and $\frac{I_{on}}{I^{off}}=10^4$. The GaAs NW chip greatly outperfroms other current NW, carbon nanotube, or graphene Field Effect Transistors (FET) (Figure \ref{fig:best}). \cite{Miao_2014}