6. References
[1] H. Noh, H. An, J. Lee, J. Song, H.J. Hong, S. Seo, S.Y. Jeong,
B.-J. Kim, S. Ryu, S. Lee, Large enhancement of the photocurrent density
in N-doped Cu3N films through bandgap reduction, Journal of the Korean
Ceramic Society 57(3) (2020) 345-351.
[2] A. Tilemachou, M. Zervos, A. Othonos, T. Pavloudis, J.
Kioseoglou, p-Type Iodine-Doping of Cu3N and Its Conversion to γ-CuI for
the Fabrication of γ-CuI/Cu3N pn Heterojunctions, Electronic Materials
3(1) (2022) 15-26.
[3] C.M. Caskey, R.M. Richards, D.S. Ginley, A. Zakutayev, Thin film
synthesis and properties of copper nitride, a metastable semiconductor,
Mater. Horiz. 1(4) (2014) 424-430.
[4] S. Okrasa, M. Wilczopolska, G. Strzelecki, K.
Nowakowska-Langier, R. Chodun, R. Minikayev, K. Król, L. Skowronski, K.
Namyślak, B. Wicher, The influence of thermal stability on the
properties of Cu3N layers synthesized by pulsed magnetron sputtering
method, Thin Solid Films 735 (2021) 138889.
[5] D.M. Borsa, D.O. Boerma, Growth, structural and optical
properties of Cu3N films, Surface Science 548(1-3) (2004) 95-105.
[6] <Design of nitride semiconductors for solar energy
conversion.pdf>.
[7] G. Sahoo, Site selective Ag doping in Cu3N and its consequences
on structural and electronic properties: A DFT study, Physica B:
Condensed Matter 619 (2021) 413238.
[8] M. Asano, K. Umeda, A. Tasaki, Cu3N thin film for a new light
recording media, Japanese Journal of Applied Physics 29(10R) (1990)
1985.
[9] M. Wilczopolska, K. Nowakowska-Langier, S. Okrasa, L.
Skowronski, R. Minikayev, G.W. Strzelecki, R. Chodun, K. Zdunek,
Synthesis of copper nitride layers by the pulsed magnetron sputtering
method carried out under various operating conditions, Materials 14(10)
(2021) 2694.
[10] C. Gallardo-Vega, W. De la Cruz, Study of the structure and
electrical properties of the copper nitride thin films deposited by
pulsed laser deposition, Applied surface science 252(22) (2006)
8001-8004.
[11] A. Majumdar, S. Drache, H. Wulff, A.K. Mukhopadhyay, S.
Bhattacharyya, C.A. Helm, R. Hippler, Strain effects by surface
oxidation of Cu3N thin films deposited by DC magnetron sputtering,
Coatings 7(5) (2017) 64.
[12] M.R. Zamani Meymian, A. Delavari Heravi, A. Kosari Mehr,
Influence of bias voltage on optical and structural characteristics of
Cu3N films deposited by reactive RF magnetron sputtering in a pure
nitrogen atmosphere, Materials Science in Semiconductor Processing 112
(2020) 104995.
[13] A. Razeghizadeh, M. Mahmoudi Ghalvandi, F. Sohillian, V. Rafee,
The Effect of Substrate on Structural and Electrical Properties of Cu3N
Thin Film by DC Reactive Magnetron Sputtering, Physical Chemistry
Research 5(3) (2017) 497-504.
[14] S.-C. Chen, S.-Y. Huang, S. Sakalley, A. Paliwal, Y.-H. Chen,
M.-H. Liao, H. Sun, S. Biring, Optoelectronic properties of Cu3N thin
films deposited by reactive magnetron sputtering and its diode
rectification characteristics, Journal of Alloys and Compounds 789
(2019) 428-434.
[15] H. Park, H. Seo, S.E. Kim, Anti-oxidant copper layer by remote
mode N2 plasma for low temperature copper–copper bonding, Scientific
reports 10(1) (2020) 1-13.
[16] A.N. Fioretti, C.P. Schwartz, J. Vinson, D. Nordlund, D.
Prendergast, A.C. Tamboli, C.M. Caskey, F. Tuomisto, F. Linez, S.T.
Christensen, E.S. Toberer, S. Lany, A. Zakutayev, Understanding and
Control of Bipolar Self-Doping in Copper Nitride, J Appl Phys 119(18)
(2016).
[17] J. Xiao, M. Qi, Y. Cheng, A. Jiang, Y. Zeng, J. Ma, Influences
of nitrogen partial pressure on the optical properties of copper nitride
films, RSC Advances 6(47) (2016) 40895-40899.
[18] X. Zhou, D. Gall, S.V. Khare, Mechanical properties and
electronic structure of anti-ReO3 structured cubic nitrides, M3N, of d
block transition metals M: An ab initio study, Journal of alloys and
compounds 595 (2014) 80-86.
[19] A. Fallberg, M. Ottosson, J.-O. Carlsson, Phase stability and
oxygen doping in the Cu–N–O system, Journal of crystal growth 312(10)
(2010) 5.
[20] A. Sajeev, A.M. Paul, R. Nivetha, K. Gothandapani, T.S. Gopal,
G. Jacob, M. Muthuramamoorty, S. Pandiaraj, A. Alodhayb, S.Y. Kim, Q.
Van Le, P.L. Show, S.K. Jeong, A.N. Grace, Development of Cu3N
electrocatalyst for hydrogen evolution reaction in alkaline medium, Sci
Rep 12(1) (2022) 2004.
[21] K. Nowakowska-Langier, R. Chodun, R. Minikayev, S. Okrasa, G.W.
Strzelecki, B. Wicher, K. Zdunek, Phase composition of copper nitride
coatings examined by the use of X-ray diffraction and Raman
spectroscopy, Journal of Molecular Structure 1165 (2018) 79-83.
[22] M. Zervos, A. Othonos, T. Pavloudis, S. Giaremis, J.
Kioseoglou, K. Mavridou, M. Katsikini, F. Pinakidou, E.C. Paloura,
Impact of Oxygen on the Properties of Cu3N and Cu3–x N1–x O x, The
Journal of Physical Chemistry C 125(7) (2021) 3680-3688.
[23] A. Jiang, M. Qi, J. Xiao, Preparation, structure, properties,
and application of copper nitride (Cu 3 N) thin films: A review, Journal
of Materials Science & Technology 34(9) (2018) 1467-1473.
[24] Y.-H. Chen, P.-I. Lee, S. Sakalley, C.-K. Wen, W.-C. Cheng, H.
Sun, S.-C. Chen, Enhanced Electrical Properties of Copper Nitride Films
Deposited via High Power Impulse Magnetron Sputtering, Nanomaterials
12(16) (2022) 2814.