I acknowledge the edX UBCx Phot1x Silicon Photonics Design, Fabrication and Data Analysis course, which is supported by the Natural Sciences and Engineering Research Council of Canada (NSERC) Silicon Electronic-Photonic Integrated Circuits (SiEPIC) Program. The devices were fabricated by Richard Bojko at the University of Washington Washington Nanofabrication Facility, part of the National Science Foundation’s National Nanotechnology Infrastructure Network (NNIN), and Cameron Horvath at Applied Nanotools, Inc. Hossam Shoman performed the measurements at The University of British Columbia. We acknowledge Lumerical Solutions, Inc., Mathworks, Mentor Graphics, Python, and KLayout for the design software.
References
[1] R. J. Bojko, J. Li, L. He, T. Baehr-Jones, M. Hochberg, and Y. Aida, "Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides," J. Vacuum Sci. Technol. B 29, 06F309 (2011)
[2] Lukas Chrostowski, Michael Hochberg, chapter 12 in "Silicon Photonics Design: From Devices to Systems", Cambridge University Press, 2015
[3] http://siepic.ubc.ca/probestation, using Python code developed by Michael Caverley.
[4] Yun Wang, Xu Wang, Jonas Flueckiger, Han Yun, Wei Shi, Richard Bojko, Nicolas A. F. Jaeger, Lukas Chrostowski, "Focusing sub-wavelength grating couplers with low back reflections for rapid prototyping of silicon photonic circuits", Optics Express Vol. 22, Issue 17, pp. 20652-20662 (2014) doi: 10.1364/OE.22.020652