T UNCERTAINTY OF WHITE LIGHT INTERFEROMETRY ON ROUGHNESS SURFACE SiO2 WITH SURFACE PROFILE NT1100 Experiment Methods Mech 529 Research 4/30/2015
The technique of inspecting and measurement of the surface without touching the surface has been widely used in the semiconductor industry and research of the science field.The Optical profiler is one of the tool have been used to measurement of surface which use the methodology technique to measure the surface of the wafer without touching the surface using white laser light technology .In a decade, the engineers and scientists have been researching a new Metrology (methods) to measure with less possible uncertainties used white laser in optical profile.At the Washington State University Vancouver the student of electrical engineer major has the opportunity to do experiment using optical profile to measure the surface. The experiment condition in the clean room with Class-100 and nano electronic photonics device as the tool. The goal of this experiment to understand uncertainty of optical profile , we will provide a brief testing surface Silicon oxide (SiO2) .The measurement will determine the uncertainty of optical profile using the silicon oxidation without treatments as the sample surface to test . The process will test at one location on the surface with four of the tests to get the roughness of height of the spot 100x100 micro meter on a surface of SiO2. The deviation of the four tests height are 274.3 nm with comparison of the the operation manual optical profiler measurement is 160 nm with VSI. The data show the error height deviation on the surface and manual process error 40 percent.
Keyword: accuracy, optical critical dimension metrology, uncertainty analysis