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Enhanced Photoreactivity of MOFs by Intercalating Interlayer Bands via simultaneous −N=C=O and −SCu Modification
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  • Wei-Fei Hu,
  • Shuo Chen,
  • Hong-Chao Hao,
  • Jiang Hong
Wei-Fei Hu
University of Science and Technology of China

Corresponding Author:huwf@mail.ustc.edu.cn

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Shuo Chen
University of Science and Technology of China
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Hong-Chao Hao
University of Science and Technology of China
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Jiang Hong
University of Science and Technology of China
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Herein, we propose a novel method to enhance the photoreactivity of an MOF catalyst by grafting isocyanate bonds (−N=C=O) and sulfhydryl-complexed copper (−SCu) onto ZIF-8 (NIF-SCu). The grafting process intercalated interlayer bands between the conduction and valence bands of ZIF-8, thereby providing a “ladder” for facile electron transition. The extreme improvement in the photoreactivity of NIF-SCu could be attributed to the enhancement in light responses in the range of 350–450 nm by −N=C=O groups and the widening of the visible light range of the MOF by −SCu groups. The formation of staggered energy levels in NIF-SCu could also narrow the band gap, lower the resistance, and facilitate the transfer of photogenerated carriers, thereby generating electrons with strong reduction potential in the −SCu conduction band. This study provides a new strategy for improving or even endowing the photoactivity of environmental functional materials with wide bandgaps.
02 Jul 2022Submitted to AIChE Journal
12 Jul 2022Submission Checks Completed
12 Jul 2022Assigned to Editor
15 Jul 2022Reviewer(s) Assigned
26 Jul 2022Editorial Decision: Revise Minor
10 Aug 20221st Revision Received
10 Aug 2022Submission Checks Completed
10 Aug 2022Assigned to Editor
14 Aug 2022Editorial Decision: Accept
21 Aug 2022Published in AIChE Journal. 10.1002/aic.17879